optical diagnostics for thin film processing

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Optical Diagnostics For Thin Film Processing

Author : Irving P. Herman
ISBN : 0080538088
Genre : Technology & Engineering
File Size : 61. 57 MB
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This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing Useful as an introduction to the subject or as a resource handbook Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing Examples emphasize applications in microelectronics and optoelectronics Introductory chapter serves as a guide to all optical diagnostics and their applications Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic

Database Needs For Modeling And Simulation Of Plasma Processing

Author : Panel on Database Needs in Plasma Processing
ISBN : 9780309573535
Genre : Science
File Size : 49. 34 MB
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In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

Optical Engineering

Author :
ISBN : CORNELL:31924077898520
Genre : Optical instruments
File Size : 29. 60 MB
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Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.

Feedback Control Of Mems To Atoms

Author : Jason J. Gorman
ISBN : 9781441958327
Genre : Technology & Engineering
File Size : 32. 74 MB
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Control from MEMS to Atoms illustrates the use of control and control systems as an essential part of functioning integrated systems. The book is organized according to the dimensional scale of the problem, starting with micro-scale systems and ending with atomic-scale systems. Similar to macro-scale machines and processes, control systems can play a major role in improving the performance of micro- and nano-scale systems and in enabling new capabilities that would otherwise not be possible. However, the majority of problems at these scales present many new challenges that go beyond the current state-of-the-art in control engineering. This is a result of the multidisciplinary nature of micro/nanotechnology, which requires the merging of control engineering with physics, biology and chemistry.

Optical Materials And Applications

Author : Arnold Rosental
ISBN : 0819459534
Genre : Science
File Size : 68. 39 MB
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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Crystal Growth In Space And Related Optical Diagnostics

Author : Ravindra Behari Lal
ISBN : UOM:39015025257919
Genre : Science
File Size : 56. 42 MB
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Laser Focus World

Author :
ISBN : UCSD:31822023356231
Genre : Electrooptics
File Size : 87. 34 MB
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Global electro-optic technology and markets.

Sci Tech News

Author :
ISBN : UCSD:31822022762132
Genre : Science and technology libraries
File Size : 83. 73 MB
Format : PDF
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Conference Proceedings

Author :
ISBN : UIUC:30112007973586
Genre : Electrooptics
File Size : 22. 36 MB
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Novel Control Diagnostics For Plasma Processing

Author : Helen Louise Maynard
ISBN : WISC:89099038036
Genre :
File Size : 54. 25 MB
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