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This is an updated manual covering the theory and practice of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) techniques for surface analysis. Topics covered include historical development; all relevant theory for data interpretation and a description of instrumentation; the major fields of applications, such as metallurgy, polymers, semiconductors, and corrosion science; catalysis; and many appendices of essential data for day-to-day use. This new edition also takes into account improvements in equipment, experimental procedures and data interpretation over the last seven years.