developments in surface contamination and cleaning vol 3 methods for removal of particle contaminants

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Developments In Surface Contamination And Cleaning

Author : Rajiv Kohli
ISBN : 9781437778816
Genre : Science
File Size : 42. 94 MB
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In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Feature: Comprehensive coverage of innovations in surface contamination and cleaning Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning problem, saving the time involved in consulting a range of disparate sources. Feature: Written by established experts in the contamination and cleaning field Benefit: Provides an authoritative resource Feature: Each chapter is a comprehensive review of the state of the art. Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute innovations. Feature: Case studies included Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning and contamination problems.

Developments In Surface Contamination And Cleaning Volume 7

Author : Rajiv Kohli
ISBN : 9780323311458
Genre : Technology & Engineering
File Size : 45. 49 MB
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As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects

Developments In Surface Contamination And Cleaning Volume 4

Author : Rajiv Kohli
ISBN : 9781437778847
Genre : Science
File Size : 41. 27 MB
Format : PDF, Kindle
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In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included

Developments In Surface Contamination And Cleaning Volume 8

Author : Rajiv Kohli
ISBN : 9780323312714
Genre : Technology & Engineering
File Size : 83. 88 MB
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As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Covers novel wet and dry surface cleaning methods of increasing commercial importance

Developments In Surface Contamination And Cleaning Vol 2

Author : Rajiv Kohli
ISBN : 1437778305
Genre : Science
File Size : 62. 66 MB
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Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning

Developments In Surface Contamination And Cleaning

Author : Rajiv Kohli
ISBN : 0815515553
Genre : Technology & Engineering
File Size : 57. 65 MB
Format : PDF, ePub, Docs
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Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated. . Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical. . A single source document addressing everything from the sources of contamination to their removal and prevention. . Amply referenced and profusely illustrated.

Particle Adhesion And Removal

Author : K. L. Mittal
ISBN : 9781118831540
Genre : Technology & Engineering
File Size : 39. 54 MB
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The book provides a comprehensive and easily accessiblereference source covering all important aspects of particleadhesion and removal. The core objective is to cover bothfundamental and applied aspects of particle adhesion and removalwith emphasis on recent developments. Among the topics to be covered include: 1. Fundamentals of surface forces in particle adhesion andremoval. 2. Mechanisms of particle adhesion and removal. 3. Experimental methods (e.g. AFM, SFA,SFM,IFM, etc.) tounderstand particle-particle and particle-substrateinteractions. 4. Mechanics of adhesion of micro- and nanoscaleparticles. 5. Various factors affecting particle adhesion to a variety ofsubstrates. 6. Surface modification techniques to modulate particleadhesion. 7. Various cleaning methods (both wet & dry) for particleremoval. 8. Relevance of particle adhesion in a host of technologies rangingfrom simple to ultra-sophisticated.

Energy Research Abstracts

Author :
ISBN : UIUC:30112008961689
Genre : Power resources
File Size : 22. 88 MB
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Includes all works deriving from DOE, other related government-sponsored information and foreign nonnuclear information.

Coal Abstracts

Author :
ISBN : STANFORD:36105013128454
Genre : Coal
File Size : 66. 78 MB
Format : PDF
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Government Reports Announcements Index

Author :
ISBN : UOM:39015034724925
Genre : Science
File Size : 51. 23 MB
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